Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different depo sition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.

作 者： 張大偉 范樹(shù)海 高衛(wèi)東 賀洪波 王英劍 邵建達(dá) 范正修 孫浩杰   作者單位： 張大偉,范樹(shù)海,高衛(wèi)東,賀洪波,王英劍,邵建達(dá),范正修(R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800)

孫浩杰(Qufu First High School, Qufu 273100) 

刊 名： 激光與光電子學(xué)進(jìn)展  ISTIC PKU 英文刊名： CHINESE OPTICS LETTERS  年，卷(期)： 2004 2(5)  分類號(hào)：   關(guān)鍵詞：  

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